Single-Crystal Wafers & Substrates

Sapphire Wafers & Substrates

Bare single-crystal sapphire (α-Al₂O₃) wafers and substrates for thin-film deposition, epitaxial research, and materials development.

  • Germany-based supplier and manufacturing partner
  • Manufacturing to customer specifications
  • Optical inspection and measurement against specified requirements
  • From single components and prototypes to repeat supply
Three transparent circular sapphire substrates of different sizes with polished surfaces

Product overview

Sapphire is single-crystal α-aluminum oxide (Al₂O₃), combining high hardness, chemical resistance, electrical insulation, and thermal stability. These properties make it suitable for selected thin-film deposition, epitaxial research, and elevated-temperature processing applications.

Key advantages

  • High hardness and wear resistance
  • Good chemical stability under many processing conditions
  • Thermal stability for elevated-temperature applications
  • Electrical insulation and useful dielectric properties
  • Broad optical transparency across a wide spectral range, depending on material grade and thickness

Typical specifications

Representative Sapphire Wafer and Substrate Specifications
MaterialSingle-crystal sapphire (α-Al₂O₃)
Round diametersØ25.4 mm; Ø50.8 mm; other diameters on request
Rectangular dimensions10 × 3 mm; 10 × 5 mm; 10 × 10 mm; 20 × 20 mm; other sizes on request
Thickness0.5 mm; 1.0 mm; other thicknesses on request
Thickness tolerance±0.02 mm; ±0.005 mm
Crystal orientationC-plane (0001); A-plane (11-20); R-plane (1-102); M-plane (10-10)
Orientation tolerance±0.5°
Surface finishSingle-side polished (SSP) or double-side polished (DSP)
Surface roughness≤5 Å (5 × 5 µm measurement area)
Edge orientation accuracy2°; 1° on request
Special tilt angle1°–45°

Properties

Growth method
Czochralski
Crystal structure
Corundum (trigonal)
Space group
R-3c (No. 167)
Lattice parameters
a ≈ 4.758 Å; c ≈ 12.991 Å
Density
3.98 g/cm³
Mohs hardness
9
Melting point
2040 °C
Specific heat capacity
0.757 J/(g·K) at room temperature
Thermal conductivity
35.1 W/(m·K) ∥ c-axis; 33.0 W/(m·K) ⊥ c-axis
Thermal expansion coefficient
4.3 × 10⁻⁶ K⁻¹ ∥ a-axis; 3.9 × 10⁻⁶ K⁻¹ ∥ c-axis (294 K); 9.2 × 10⁻⁶ K⁻¹ ∥ a-axis; 9.3 × 10⁻⁶ K⁻¹ ∥ c-axis (757 K)
Dielectric constant (εᵣ)
9.4 ∥ a-axis; 11.5 ∥ c-axis (295 K); 9.3 ∥ a-axis; 11.3 ∥ c-axis (80 K)
Dielectric loss tangent (tan δ)
< 1 × 10⁻⁶ at 80 K (microwave)
Transmission range
0.17–5.5 µm, depending on material grade and thickness

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RFQ PREPARATION

What to send for a quote

Please send your drawing or technical specification together with the following information.

  • Required crystal orientation and dimensions
  • Thickness, dimensional tolerances, and geometry requirements
  • Required miscut (off-axis) angle and direction
  • Surface finish and required surface roughness
  • Required quantity
Request a Quote